Dual Heavy Pulse Laser II
This heavy pulse laser uses two separate laser focusing systems to reduce the cool down period between shots. A great weapon for medium to long range encounters.
Requires either regular or advanced frequency crystal ammo types: Gamma, Infrared, Microwave, Multifrequency, Radio, Standard, Ultraviolet, Xray, Conflagration, Scorch.  Public: yes Mass: 1 kg- Volume: 20 m3
- Capacity: 1 m3
 Meta Level: 5- Tech Level: 2
Fitting  Powergrid Usage: 1,650 MW CPU Usage: 42 tf Structure  Structure Hitpoints: 40 HP Capacitor  Activation Cost: 25 GJ Targeting  Optimal Range: 21 km, 600 m Trackingspeed / Accuracy: 0.0375 rad/sec Miscellaneous  Rate Of Fire: 6 sec, 75 ms Damage Modifier: 2.4x Charge Size: Large Accuracy Falloff: 6 km- Used With (Chargegroup): Charge / Frequency Crystal
- Used With (Chargegroup): Charge / Advanced Pulse Laser Crystal
- Signature Resolution: 400 m
 Overload Damage Bonus: 15%- Heat Damage: 0.7 HP
- Required Thermodynamics Level: 1 Level
- Color Scheme: 11,314
Other - Slots Occupied: 1
- Target Module: 0
- Heat Dissipation Rate Modifier: 0.02
Blueprint
- Public: yes
- Volume: 0.01 m3
- Tech Level: 2
- Wastage Factor: 10%
- Max Runs Per Blueprint Copy: 100
 Manufacturing Time: 3 hr, 20 min- Research Material Time: 13 hr, 20 min
- Research Copy Time: 13 days, 21 hr, 20 min
- Research Productivity Time: 20 hr
- Research Invention Time: 2 days, 2 hr
- Productivity Modifier: 2,400
- Material Modifier: 5
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